EPP Small Experiments Document 10-v1

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Manufacture of High Resistivity, Low Oxygen Czochralski Silicon

Document #:
EPP-doc-10-v1
Document type:
Talk
Submitted by:
Ronald Lipton
Updated by:
Ronald Lipton
Document Created:
26 Oct 2005, 20:44
Contents Revised:
26 Oct 2005, 20:44
Metadata Revised:
28 Oct 2005, 11:15
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Abstract:
RD50 talk on the manufacture of high resistivity silicon
using magnetic Czochralski technique.
Author = Olli Antilla
Files in Document:
  • ppt (CERN_RD-50_06_2005_Okmetic_OA.ppt, 7.9 MB)
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Keywords:
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